Atomic layer deposition – the intersection of materials science, physics, chemistry and industry
There are thousands of techniques of making materials. But how can something be made, that is so small, it is not even visible under a regular optical microscope? For example, today’s electronics industry routinely makes thin films that have a thickness of 100 nanometers (nm), 50 nm or even 3 nm. And how is such a material studied, for determining a novel material in a research laboratory or performing quality control in a company? How can one measure a material’s thickness and composition if it’s thickness is a mere 10 nm, for example?
Atomic Layer Deposition (ALD) is a thin-film deposition technique that plays a critical role in advancing modern technologies, from semiconductors and energy storage to coatings for medical devices and optics. Its unique ability to deposit ultra-thin films with atomic-level precision makes it a cornerstone of innovation in nanotechnology and materials science. Most computers, solar panels and mobile phones have some details in them made using ALD. But the fun doesn’t stop at currently existing technologies. Scientists and engineers are constantly working to find new ways how to utilize thin films made by ALD in various new technologies, such as neuromorphic computing that is advancing AI.
This course offers participants a rare opportunity to explore ALD and it’s applications in depth, blending theoretical knowledge with hands-on experience. You will not only learn the principles and applications of ALD but also operate equipment to perform your own film depositions. Beyond that, you'll gain experience in characterization techniques, including spectroscopic ellipsometry, X-ray diffraction (XRD), and scanning electron microscopy (SEM), to analyze the structure, composition, and properties of the deposited films.
At the conclusion of the course, you will collaborate in groups to compile your findings and theoretical knowledge into a comprehensive project report. This report will be presented to other groups and will include a detailed description of the project's background, a summary of your results, and a concluding discussion, including potential applications of the films you have deposited.
Information about the course
Focus area: | Thin film deposition and characterization | Coordinating unit: | Institute of Clinical Medicine |
Study Field: | Materials science, nanomaterials | Course Leader: | Kristjan Kalam, PhD |
Format: | Summer Course | Location: | Institute of Physics |
Course dates: | 28 July - 8 August 2025 | Language: | English |
ECTS: | 3 | Study group: | BA/MA students |
Lecturers
Kristjan Kalam, PhD | Taivo Jõgiaas, PhD | Jekaterina Kozlova, PhD |
| Research Fellow in Materials Science at the University of Tartu's Institute of Physics, specifically within the Laboratory of Thin Film Technology. His research focuses on areas such as atomic layer deposition, ellipsometry, x-ray diffraction, and ferromagnetism. | Research Fellow in Materials Science at the University of Tartu's Institute of Physics, specifically within the Laboratory of Thin Film Technology.He has contributed to over 30 publications, with his research focusing on areas such as atomic layer deposition and the mechanical and optical properties of thin films. |
Application deadline: 30 April 2025
Application period: 1 April - 30 April 2025
NB! All of the applicants are required to pay a non-refundable application fee of EUR 25. Your application will only be processed after the University has received the fee. The application fee is required to facilitate the admissions process and will not be refunded, regardless of the admission result.
Course fee: 800EUR
Includes:
Study materials
10 days of academic work with lecturers
Certificate of completion (3 ECTS)
5 cultural events in the evenings
NB! Transportation and accommodation costs are not included. The course fee does not cover participant's lunch during the summer school.
NB! This is a preliminary programme. The final schedule will be sent to the participants two weeks before the course starts.
Monday, July 28
Introduction to the course.
Overview of the tasks and workshops in the course.
Tuesday, July 29
Theoretical lectures.
Overview of main methods of making nanomaterials.
Theoretical basis for ALD.
Comparisons of ALD and other methods.
Wednesday, July 30
Theoretical lectures.
Applications of ALD.
Thursday, July 31
Practical studies.
Participants will be taken to a laboratory with ALD reactors, divided into groups and they will start to learn the operations of an ALD reactor by operating it themselves, under the supervision of the course teacher(s). Each group will deposit and study a different material.
Friday, August 1
Practical studies.
Activities from the previous day continue, as the participants will operate the ALD reactors under supervision and by the end of the workweek, every group will have made their own different thin films with „their own hands“, which they will start to study the next week.
Saturday/Sunday, August 2-3
Weekend/cultural events.
Monday, August 4
Theoretical lectures.
Various methods of characterizing thin films are discussed and their basic principles studied.
Tuesday, August 5
Practical studies.
Groups will start to characterize their films, which they made the previous week. They will use state-of-the-art characterization tools, under supervision of course teacher(s).
Wednesday, August 6
Practical studies.
Groups will continue to characterize their films.
Thursday, August 7
Practical studies. Groups will continue to characterize their films.
Friday, August 8
Groups will present their works in the form of oral presentations with accompanying slides with the results they have obtained during the course. This is followed by Q and A among all groups and participants and also feedback from course teachers.
Saturday/Sunday, August 9-10
Departure.
Upon completing the course, students will be able to:
- describe, what is the method of atomic layer deposition (ALD), what are its advantages and limitations and can broadly name its applications.
- understand how an ALD reactor works and can operate a similar device under supervision.
- have a basic understanding of some state-of-the-art material characterization tools, such as spectroscopic ellipsometry, X-ray diffraction and scanning electron microscopy. They will also have an understanding how such machines are operated and can perform these operations under supervision.
- produce and present a group project that includes their results, discusses the reasons behind the observed outcomes, interprets their significance, and explores potential applications of the produced material.
Students will have to compile their obtained results to a coherent project report and create a presentation to present these results on the last day. Other assignments are given and completed during the course.
Independent reading
30-40 pages on different topics given during the course by teachers.
Which previous knowledge is required?
High-school level physics and chemistry
Entry requirements:
- Online application form (application period April 1 - April 30 2025)
- Motivation letter (up to 1 page) that demonstrates the applicant’s motivation to participate, his/her expectations about the programme, how participation in the summer programme relates to his/her studies and interests, and how the applicant plans to use the gained experience and knowledge in the future.
- Transcript of academic records
- Copy of passport
PS: Only complete applications including all annexes submitted by the deadline will be considered for selection.
